EUV极紫外光刻
EUV, or extreme ultraviolet lithography, is a photolithography method that uses very short-wavelength light around 13.5 nm to print fine circuit patterns on wafers during advanced integrated circuit manufacturing. In semiconductor manufacturing documentation, the term appears in process-node disclosures, lithography equipment manuals, photomask and photoresist discussions, R&D roadmaps, and cost-per-layer analyses, where it is distinguished from longer-wavelength DUV processes and from other patterning methods.
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Where this term appears
EUV appears in lithography tool descriptions, process integration papers, fab expansion announcements, and advanced-node technical marketing materials. Translators must handle it when localizing equipment safety notes, optical subsystem descriptions, vacuum system documentation, and metrology or overlay discussions, often keeping the abbreviation EUV while providing the Chinese term on first use.
Translation checks
A frequent mistake is expanding EUV as 'ultra-violet lithography' or confusing it with deep ultraviolet (DUV). That erases a critical technical distinction in wavelength and equipment, which can distort process comparisons and investment or roadmap documents. Another issue is leaving the abbreviation unexplained for non-technical audiences while translating surrounding text.
Keep the term aligned across your files
Technical terms need checking against the source, approved product terminology and related specifications. Keep units, parameter conditions and document versions aligned across the file set.
Provide approved terms and previous translations with the source files. Agree how variants, ambiguous wording and revisions will be reviewed. Terminology maintenance and any termbase handback are confirmed in the project scope. See the 8-step AI + expert workflow.
Related document experience
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SMIC (Semiconductor Manufacturing International)
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Read the published project →Published scope shows related industry experience; it does not confirm that this specific term was used or reviewed in the project.
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