CD-SEM (Critical Dimension Scanning Electron Microscope)关键尺寸扫描电子显微镜
A CD-SEM is a scanning electron microscope configured to measure the dimensions of fine patterns on semiconductor wafers. The abbreviation refers to the measuring instrument. CD refers to the critical dimension being measured.
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Where this term appears
For a Chinese metrology report, keep measurement units, pattern identifiers and the stage of inspection attached to each result. Compare captions and column headers with the tool terminology in the source. A table headed “CD results” describes measurements even if its caption names the CD-SEM model.
Translation checks
Avoid using “defect inspection” for a dimensional measurement unless the source identifies a separate inspection task. Preserve the distinction between a target CD, a measured CD and a tolerance. The instrument name alone does not specify the feature or acceptance criterion.
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Technical terms need checking against the source, approved product terminology and related specifications. Keep units, parameter conditions and document versions aligned across the file set.
Provide approved terms and previous translations with the source files. Agree how variants, ambiguous wording and revisions will be reviewed. Terminology maintenance and any termbase handback are confirmed in the project scope. See the 8-step AI + expert workflow.
Related document experience
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Japanese → ChineseJapanese-to-Chinese documentation for a listed Japanese semiconductor manufacturer.
Read the published project →
SMIC (Semiconductor Manufacturing International)
English ⇄ ChineseCorporate reporting and disclosure documentation, delivered across successive annual cycles.
Read the published project →Published scope shows related industry experience; it does not confirm that this specific term was used or reviewed in the project.
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