Overlay Error套刻误差
Overlay error is the measured misalignment between a newly patterned layer and previously patterned layers on a wafer, expressed as a vector with magnitude and direction. It appears in lithography process specifications, overlay metrology reports, process control charts, and yield-analysis documents where layer-to-layer registration is compared against tolerance limits; the term also occurs in scanner/stepper alignment recipes and in design rules that budget overlay for multi-patterning steps.
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Where this term appears
In localization, overlay error appears in lithography process specifications, metrology tool reports, statistical process control dashboards, and scanner alignment recipe documentation. It is also common in failure-analysis and yield-learning texts where engineers discuss correction models, sampling plans, and root causes of layer-to-layer misregistration. Translators often see it with terms such as residual overlay, correctables, and modeling coefficients.
Translation checks
A common mistake is translating overlay error as '覆盖误差' or '重叠错误,' which suggests a software layer problem rather than wafer pattern misalignment. Another issue is treating it as a scalar percentage when it is usually a vector; losing direction and per-axis data in translated tables can misrepresent process capability and alignment correction decisions.
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Related document experience
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