Overlay套刻精度
Overlay is the measured alignment accuracy between a newly patterned lithography layer and a previously formed layer on the wafer, often expressed as a translation, rotation, or overlay error in nanometers. It appears in lithography documentation such as exposure tool logs, process control charts, overlay measurement reports, and multi-patterning recipes, where misalignment can cause serious electrical shorts or opens.
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Where this term appears
Overlay appears in lithography process specifications, exposure tool logs, metrology reports, and statistical process-control charts. Localizers encounter it when translating operator instructions, overlay excursion reports, equipment alarms, software interface labels, and on-screen alarm text, where overlay error, target offset, and correctables must match the exact metrology system output.
Translation checks
A common error is translating overlay as coverage or covering layer, which confuses alignment accuracy with a film covering the wafer. Another mistake is treating overlay and overlay error as identical in software strings and reports, masking the distinction between a measured parameter and its deviation from target in lithography control.
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