Reticle光罩
A reticle is a photomask used in step-and-repeat projection lithography, carrying the pattern for one or more die fields that are exposed repeatedly across a wafer. In lithography tool recipes, reticle management documents, and overlay or registration specifications, the term denotes the mask plate loaded into the scanner or stepper, where field size, magnification, and alignment marks are critical for exposure setup.
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Where this term appears
In translation work, reticle appears in lithography equipment user interfaces, mask management software, and job files. It is often contrasted with photomask, and localizers must preserve the distinction when translating stepper/scanner documentation, overlay measurements, and reticle inspection reports. This distinction affects equipment setup and process control content.
Translation checks
A common mistake is to translate reticle as “掩膜版” without noting its use in steppers or scanners, or to treat it as identical to a wafer-scale photomask. This can produce incorrect mask loading instructions, overlay references, and tool messages in lithography workflows if the mask format is misunderstood. Misunderstanding the mask format can lead to setup errors.
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Related document experience
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