Stepper步进光刻机
A stepper is a lithography tool that projects a reticle pattern onto one exposure field of a wafer while the stage holds the field stationary, then moves the wafer to the next field and repeats the process. In semiconductor manufacturing documentation, it appears in process flow descriptions, equipment specifications, and maintenance or calibration records where lithography steps and alignment are defined.
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Where this term appears
In translation and localization, stepper appears in lithography equipment manuals, wafer fab standard operating procedures, process specifications, and operator training materials. It also shows up in recipe management software strings, maintenance checklists, and alarm or event logs where the exposure tool type must be identified clearly. The term frequently occurs in English source content produced by equipment vendors and is translated for fabs in Chinese, Japanese, or Korean.
Translation checks
A common error is translating stepper as 'stepping machine' or '步进机' without the lithography context, which makes it sound like a generic motorized stage. Another error is conflating it with scanner; in older stepper documentation, the reticle and wafer are stationary during exposure, so using terms associated with scanning lithography can distort process limits.
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Related document experience
Torex Semiconductor
Japanese → ChineseJapanese-to-Chinese documentation for a listed Japanese semiconductor manufacturer.
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SMIC (Semiconductor Manufacturing International)
English ⇄ ChineseCorporate reporting and disclosure documentation, delivered across successive annual cycles.
Read the published project →Published scope shows related industry experience; it does not confirm that this specific term was used or reviewed in the project.
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